Machine Learning-Based Modelling in Atomic Layer Deposition Processes

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Machine Learning-Based Modelling in Atomic Layer Deposition Processes achterzijde
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This book describes the application of machine learning modelling approaches in atomic layer deposition and presents detailed information on modelling, optimization, and prediction of the behaviour and characteristics of ALD for improved process quality control.

Specificaties
ISBN/EAN 9781032386737
Auteur Oluwatobi Adeleke
Uitgever Van Ditmar Boekenimport B.V.
Taal Engels
Uitvoering Paperback / gebrocheerd
Pagina's 354
Lengte
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