Atomic Layer Deposition
Principles, Characteristics, and Nanotechnology Applications
Since the first edition was published in 2008, Atomic Layer Deposition (ALD) has emerged as a powerful, and sometimes preferred, deposition technology. The new edition of this groundbreaking monograph is the first text to review the subject of ALD comprehensively from a practical perspective.
Specificaties
| ISBN/EAN | 9781118062777 |
| Auteur | Tommi Kaariainen |
| Uitgever | Van Ditmar Boekenimport B.V. |
| Taal | Engels |
| Uitvoering | Gebonden in harde band |
| Pagina's | 272 |
| Lengte | |
| Breedte |